Observations of circumstellar environments to look for the direct signal of exoplanets and the scattered light from disks has significant instrumental implications. In the past 15 years, major developments in adaptive optics, coronagraphy, optical manufacturing, wavefront sensing and data processing, together with a consistent global system analysis have enabled a new generation of high-contrast imagers and spectrographs on large ground-based telescopes with much better performance. One of the most productive is the Spectro-Polarimetic High contrast imager for Exoplanets REsearch (SPHERE) designed and built for the ESO Very Large Telescope (VLT) in Chile. SPHERE includes an extreme adaptive optics system, a highly stable common path interface, several types of coronagraphs and three science instruments. Two of them, the Integral Field Spectrograph (IFS) and the Infra-Red Dual-band Imager and Spectrograph (IRDIS), are designed to efficiently cover the near-infrared (NIR) range in a single observation for efficient young planet search. The third one, ZIMPOL, is designed for visible (VIR) polarimetric observation to look for the reflected light of exoplanets and the light scattered by debris disks. This suite of three science instruments enables to study circumstellar environments at unprecedented angular resolution both in the visible and the near-infrared. In this work, we present the complete instrument and its on-sky performance after 4 years of operations at the VLT.

A slicer mirror is a complex surface composed by many tilted and decentered mirrors sub-surfaces. The major difficulty to model such a complex surface is the large number of parameters used to define it. The Zemax's multi-configuration mode is usually used to specify each parameters (tilts, curvatures, decenters) for each mirror sub-surface which are then considered independently. Otherwise making use of the User-Defined Surface (UDS-DLL) Zemax capability, we are able to consider the set of sub-surfaces as a whole surface. In this paper, we present such a UDS-DLL tool comparing its performance with those of the classical multi-configuration mode. In particular, we explore the use of UDS-DLL to investigate the cross-talk due to the diffraction on the slicer array mirrors which has been a burden task when using multi-configuration mode.

The VIRMOS Consortium has the task to design and manufacture two spectrographs for ESO VLT, VIMOS (Visible Multi-Object Spectrograph) and NIRMOS (Near Infrared Multi-Object Spectrograph). This paper describes how the Mask Manufacturing Unit (MMU), which cuts the slit masks to be used with both instruments, meets the scientific requirements and manages the storage and the insertion of the masks into the instrument. The components and the software of the two main parts of the MMU, the Mask Manufacturing Machine and the Mask Handling System, are illustrated together with the mask material and with the slit properties. Slit positioning is accurate within 15 micron, equivalent to 0.03 arcsec on the sky, while the slit edge roughness has an rms on the order of 0.03 pixels on scales of a slit 5 arcsec long and of 0.01 pixels on the pixel scale (0.205 arcsec). The MMU has been successfully installed during July/August 2000 at the Paranal Observatory and is now operational for spectroscopic mask cutting, compliant with the requested specifications.

We describe the VIRMOS Mask Manufacturing Unit (MMU) configuration, composed of two units:the Mask Manufacturing Machine (with its Control Unit) and the Mask Handling Unit (inclusive of Control Unit, Storage Cabinets and robot for loading of the Instrument Cabinets). For both VIMOS and NIRMOS instruments, on the basis of orders received by the Mask Preparation Software (see paper (a) in same proceedings), the function of the MMU is to perform an off-line mask cutting and identification, followed by mask storing and subsequent filling of the Instrument Cabinets (IC). We describe the characteristics of the LPKF laser cutting machine and the work done to support the choice of this equipment. We also describe the remaining of the hardware configuration and the Mask Handling Software.