Normalized to: Meynants, G.
[1]
oai:arXiv.org:1805.01843 [pdf] - 1677364
Measuring Intra-pixel Sensitivity Variations of a CMOS Image Sensor
Submitted: 2018-05-04
Some applications in scientific imaging, like space-based high-precision
photometry, benefit from a detailed characterization of the sensitivity
variation within a pixel. A detailed map of the intra-pixel sensitivity (IPS)
allows to increase the photometric accuracy by correcting for the impact of the
tiny sub-pixel movements of the image sensor during integration. This paper
reports the measurement of the sub-pixel sensitivity variation and the
extraction of the IPS map of a front-side illuminated CMOS image sensor with a
pixel pitch of 6 \boldmath$\mu m$. Our optical measurement setup focuses a
collimated beam onto the imaging surface with a microscope objective. The spot
was scanned in a raster over a single pixel to probe the pixel response at each
(sub-pixel) scan position. We model the optical setup in ZEMAX to
cross-validate the optical spot profile described by an Airy diffraction
pattern. In this work we introduce a forward modeling technique to derive the
variation of the IPS. We model the optical spot scanning system and discretize
the CMOS pixel response. Fitting this model to the measured data allows us to
quantify the spatial sensitivity variation within a single pixel. Finally, we
compare our results to those obtained from the more commonly used Wiener
deconvolution.
[2]
oai:arXiv.org:1801.03449 [pdf] - 1616207
A novel technique to characterize the spatial intra-pixel sensitivity
variations in a CMOS image sensor
Submitted: 2018-01-10
To understand the scientific imaging capability, one must characterize the
intra-pixel sensitivity variation (IPSV) of the CMOS image sensor. Extracting
an IPSV map contributes to an improved detector calibration that allows to
eliminate some of the uncertainty in the spatial response of the system. This
paper reports the measurement of the sub-pixel sensitivity variation and the
extraction of the 2D IPSV map of a front-side illuminated CMOS image sensor
with a pixel pitch of 6 {\mu}m. Our optical measurement setup focuses a
collimated beam onto the imaging surface with a microscope objective. The spot
was scanned in a raster over a single pixel and its immediate neighbors in
order to probe its response at selected (sub-pixel) positions. In this work we
introduced a novel technique to extract the IPSV map by fitting (forward
modeling) the measured data to a mathematical model of the image, generated in
a single pixel that allows for a spatially varying sensitivity.
[3]
oai:arXiv.org:1609.04315 [pdf] - 1480677
Noise optimization of the source follower of a CMOS pixel using BSIM3
noise model
Submitted: 2016-09-14
CMOS imagers are becoming increasingly popular in astronomy. A very low noise
level is required to observe extremely faint targets and to get high-precision
flux measurements. Although CMOS technology offers many advantages over CCDs, a
major bottleneck is still the read noise. To move from an industrial CMOS
sensor to one suitable for scientific applications, an improved design that
optimizes the noise level is essential. Here, we study the 1/f and thermal
noise performance of the source follower (SF) of a CMOS pixel in detail. We
identify the relevant design parameters, and analytically study their impact on
the noise level using the BSIM3v3 noise model with an enhanced model of gate
capacitance. Our detailed analysis shows that the dependence of the 1/f noise
on the geometrical size of the source follower is not limited to minimum
channel length, compared to the classical approach to achieve the minimum 1/f
noise. We derive the optimal gate dimensions (the width and the length) of the
source follower that minimize the 1/f noise, and validate our results using
numerical simulations. By considering the thermal noise or white noise along
with 1/f noise, the total input noise of the source follower depends on the
capacitor ratio CG/CFD and the drain current (Id). Here, CG is the total gate
capacitance of the source follower and CFD is the total floating diffusion
capacitor at the input of the source follower. We demonstrate that the optimum
gate capacitance (CG) depends on the chosen bias current but ranges from CFD/3
to CFD to achieve the minimum total noise of the source follower. Numerical
calculation and circuit simulation with 180nm CMOS technology are performed to
validate our results.