The VLT Survey Telescope (VST) is a 2.6m aperture, wide field, UV to I facility, to be installed at the European Southern Observatory (ESO) on the Cerro Paranal Chile. VST was primarily intended to complement the observing capabilities of VLT with wide-angle imaging for detecting and pre-characterising sources for further observations with the VLT.

The VIRMOS consortium of French and Italian Institutes (PI: O. Le Fevre, co-PI: G. Vettolani) is manufacturing two wide field imaging multi-object spectrographs for the European Southern Observatory Very Large Telescope (VLT), with emphasis on the ability to carry over spectroscopic surveys of large numbers of sources: the VIsible Multi-Object Spectrograph, VIMOS, and the Near InfraRed Multi-Object Spectrograph, NIRMOS. There are 52 motors to be controlled in parallel in the spectrograph, making VIMOS a complex machine to be handled. This paper will focus on the description of the control system, designed in the ESO VLT standard control concepts, and on some integration issues and problem solving strategies.

The VIRMOS Consortium has the task to design and manufacture two spectrographs for ESO VLT, VIMOS (Visible Multi-Object Spectrograph) and NIRMOS (Near Infrared Multi-Object Spectrograph). This paper describes how the Mask Manufacturing Unit (MMU), which cuts the slit masks to be used with both instruments, meets the scientific requirements and manages the storage and the insertion of the masks into the instrument. The components and the software of the two main parts of the MMU, the Mask Manufacturing Machine and the Mask Handling System, are illustrated together with the mask material and with the slit properties. Slit positioning is accurate within 15 micron, equivalent to 0.03 arcsec on the sky, while the slit edge roughness has an rms on the order of 0.03 pixels on scales of a slit 5 arcsec long and of 0.01 pixels on the pixel scale (0.205 arcsec). The MMU has been successfully installed during July/August 2000 at the Paranal Observatory and is now operational for spectroscopic mask cutting, compliant with the requested specifications.